Image Flip Oven Photolithography Inverter Equipment Ammonia Gas Oven Image Flip SystemProcess Principle:

Lithography image inversion is a specialized process used for semiconductor device manufacturing. After exposure, the image in the photoresist is the reverse of the desired image, meaning the exposed area will form holes rather than islands after development. This process is primarily used for creating hole structures, achieved by altering the relative etching rates between the exposed and unexposed areas.

Image Inverter Oven Photolithography Image Inversion Equipment Ammonia Gas Oven Image Inversion SystemApplication:

The photolithography pattern inversion process is primarily used in stripping processes, particularly in the fabrication of flexible electrodes, electrodes, and other MEMS device processes. By controlling the bottom cut side wall morphology, it prevents the formation of continuous films of deposited material at the edges and side walls of the photoresist, aiding in obtaining a clean stripping photoresist structure.

Image Flipping Oven   Photolithography Inversion Equipment   Ammonia Gas Oven   Performance of Image Flipping System：